Molecular Templating of Nanoporous Ultralow Dielectric Constant (≈1.5) Organosilicates by Tailoring the Microphase Separation of Triblock Copolymers
作者： Shu Yang , Peter A. Mirau , Chien-Shing Pai , Omkaram Nalamasu , Elsa Reichmanis
DOI: 10.1021/CM0102786
关键词:
摘要: Triblock polymers, poly(ethylene oxide-b-propylene oxide-b-ethylene oxide) (PEO-b-PPO-b-PEO), are used as molecular templates in poly(methyl silsesquioxane) (MSQ) matrixes to fabricate nanoporous organosilicates. The triblock copolymers microphase-separate into nanometer domains the MSQ matrix becomes increasingly hydrophobic during a curing step. Extremely small pores (2−5 nm) generated after thermally removing template material. These materials attain ultralow dielectric constants (k ≈ 1.5) with electrical and mechanical integrity.
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