A new application of UV-ozone treatment in the preparation of substrate-supported, mesoporous thin films

摘要: A nominally room temperature photochemical method, simply employing ultraviolet light- (187−254 nm) generated ozone environment, is shown to provide an efficient alternative for the removal of surfactant templates a routine production mesoporous silica thin films at low temperatures. The treatment concomitantly strengthens silicate phase by fostering condensation unreacted silanols leading with well-defined mesoscopic morphologies. surfactant/silicate film mesophases were prepared onto polycrystalline Au surface dip-coating or spin-casting methods using sub-critical micelle concentration (cmc) nonionic ethylene oxide in oligomeric sol mixture. structures and compositions before after exposure UV/ozone determined combination reflection−absorption Fourier transform infrared spectroscopy, transmission electron microscopy, X-ray diffraction measurements. pore c...