作者: İ. Özgür Özer , Ender Suvaci , Slavko Bernik
DOI: 10.1016/J.ACTAMAT.2010.04.003
关键词:
摘要: The relationship between microstructure texturing and electrical characteristics of a ZnO-based varistor system was investigated in comparison with having the same chemical composition but conventional microstructure. Highly textured varistors were produced via templated grain growth (TGG) technique. Stereological analysis, electron back-scattered diffractometry (EBSD) X-ray (XRD) conducted to analyze texture development orientation distribution. degree orientation, r, calculated from (0 0 1) EBSD pole figure, 0.34; fraction, f (Lotgering factor), XRD data, 0.98 for samples TGG. threshold voltages found be anisotropic, consistent observed morphological texture. non-linear coefficients, α, did not exhibit significant difference as function direction, even highly samples. However, different types boundary depending on direction identified 0.42, 0.69 1.14 eV Schottky barrier heights.