作者: Ye-hua Jiang , Bao-yin Tang , Zhao-lin Zhan , Hong-xi Liu
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摘要: Titanium nitride (TIN) hard protective films were fabricated on AISI52100 bearing steel surface employing plasma immersion ion implantation and deposition (PIIID) technique. The TiN characterized using a variety of test methods. Atomic force microscope (AFM) revealed that the titanium film has extremely smooth surface, very high uniformity efficiency space filling over large areas. X-ray diffraction (XRD) result indicated (200) crystal face phase is preferred orientation three kinds components exist in modified layer. Tailor fitting analysis photoelectron spectroscopy (XPS) combined with Ar etching proved Ti2p(1/2) Ti2p(3/2) have two peaks layer, respectively. It shown different chemical state exists compound. N(1s) bond energy XPS also at 396.51, 397. 22 399.01 eV, corresponding to nitrogen atom TiNxOy, N--N, Combined results O(1s) energy, it was there amount addition small simple substance oxide whole system made up TiN, TiO2, N--N Ti--O--N