作者: Yoshihiro Hirata
DOI: 10.1016/S0168-583X(03)00632-3
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摘要: We developed the LIGA (Lithographie or lithography/Galvanoformung electroforming/Abformung molding) process using a compact synchrotron radiation (SR) source. To make SR source applicable for process, we highly sensitive resist and transparent mask deep lithography. commercialized two devices, piezoelectric composite microprobe IC testing. A microconnector optical switch were also developed.