作者: F. Honda , T. Saito
DOI: 10.1016/0169-4332(95)00312-6
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摘要: Abstract A chemical characterization of the thin film at interface between two silicon nitrides sliding in water was performed to analyze relationship tribological properties (sliding with a low coefficient friction μ = 0.01), form lubricating layers and their practical application. The observed friction, tribo-induced reactions subsequent formation are discussed terms nitride aqueous solutions. Sliding experiments were carried out pure water, 1% hydrogen peroxide NaCl solutions, worn surface quantitatively analyzed by EPMA SEM. In solution, decreased an earlier stage test than water. This result attributed oxidizing agent which accelerated oxidation reaction. But 3% sodium chloride remained high: 0.8. Analysis wear debris solution showed that had composition equal Na 2 O · n SiO , indicating reaction + this surfaces suppressed film. We propose is composed SiOH bond, insoluble most probable form.