Reticulated shallow etch mesa isolation

作者: Nolde Jill A , Vurgaftman Igor , Jackson Eric M , Aifer Edward H , Meyer Jerry R

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摘要: A device including an absorber layer that can be deposited on top of a bottom contact layer. Furthermore, semi-intrinsic with energy gap wider than the conduction band and valence alignment positioned between layer, configured to allow photoexcited minority carriers collected while flow majority from are blocked. At least one mesa formed by processing removing layered materials depth at near Finally, shoulder in within materials.

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