作者: Hyun-Gue Kim , Sang-soo Kim
DOI:
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摘要: According to the present invention, an ion implantation system capable of implanting ions into a large substrate and reducing manufacturing cost, method using same may be provided. The includes plurality assemblies arranged in line, each assembly implant partial region substrate. This allows for compact very moves through first direction, turns around, then back second opposite where are implanted while is moving both directions. path direction can spaced-apart from allow two substrates processed simultaneously.