Exposure method and apparatus
作者： Kenji Nishi
DOI:
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摘要: An apparatus for exposing a pattern, formed on mask, each of plurality partitioned areas photosensitive substrate by step-and-repeat scheme includes projection optical system projecting the pattern mask substrate, stage holding and two-dimensionally moving within plane perpendicular to axis system, detection unit image having predetermined shape photoelectrically detecting light reflected detect position at points along measurement for, when in area which is be exposed next coincides with or approaches image, an offset amount between imaging during stepping operation stage, wherein are relatively moved accordance measured before area.
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