作者: E.E. Glickman
DOI: 10.1016/S0167-9317(02)00812-2
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摘要: From the perspective of recent contributions to field, we discuss essential physics behind short-stripe effect in drift velocity electromigration (EM), transition creep controlled short, near-threshold interconnects, role dynamic EM stresses and possible mechanism their relaxation by non-constrained diffusional into hillocks.