Effect of sheath evolution on metal ion implantation in a vacuum arc plasma source

摘要: Plasma immersion ion implantation is a surface modification technique in which ions to be implanted are drawn directly from surrounding plasma by pulse biased substrate. Ion acceleration occurs the electric sheath that forms around The most often used implant ions, such as nitrogen, plasmas formed excitation of gas. More recently it has been applied with cathodic vacuum arc order metal ions. These have directed drift velocity and generally higher density than gas based plasmas. Both these differences influence development sheath, determines profile overall stability process. If expands too much during pulse, depleted ceases. If, however, thin at any point space breakdown also stopping major parameters affecting formation density, drift...