Secondary ion emission for surface and in-depth analysis of tantalum thin films
作者： J. M. Morabito , R. K. Lewis
DOI: 10.1021/AC60328A037
关键词:
摘要:
acs.org
osti.gov
sci-hub.se 参考文章(12)
H. W. Werner, Investigation of Solids by Means of an Ion-Bombardment Mass Spectrometer Springer, Boston, MA. pp. 239- 266 ,(1969) , 10.1007/978-1-4684-8700-8_17
Charles Andrew. Evans, Ion microprobe mass spectrometric determination of oxygen in copper Analytical Chemistry. ,vol. 42, pp. 1130- 1132 ,(1970) , 10.1021/AC60293A023
R. C. Bradley, E. Ruedl, IONS SPUTTERED FROM COPPER Journal of Applied Physics. ,vol. 33, pp. 880- 888 ,(1962) , 10.1063/1.1777185
Richard C. Bradley, Secondary Positive Ion Emission from Metal Surfaces Journal of Applied Physics. ,vol. 30, pp. 1- 8 ,(1959) , 10.1063/1.1734952
Peter B. Sewell, Don F. Mitchell, Morris Cohen, A kinetic study of the initial oxidation of a Ta(110) surface using oxygen kα X-ray emission Surface Science. ,vol. 29, pp. 173- 188 ,(1972) , 10.1016/0039-6028(72)90077-5
J.M. Morabito, J.C. Tsai, In-depth profiles of phosphorus ion-implanted silicon by Auger spectroscopy and secondary ion emission☆ Surface Science. ,vol. 33, pp. 422- 426 ,(1972) , 10.1016/0039-6028(72)90220-8
Thomas O. Ziebold, Precision and sensitivity in electron microprobe analysis Analytical Chemistry. ,vol. 39, pp. 858- 861 ,(1967) , 10.1021/AC60252A028
Henry E. Stanton, ON THE YIELD AND ENERGY DISTRIBUTION OF SECONDARY POSITIVE IONS FROM METAL SURFACES Journal of Applied Physics. ,vol. 31, pp. 678- 683 ,(1960) , 10.1063/1.1735666
J V P Long, A theoretical assessment of the possibility of selected-area mass-spectrometric analysis using a focused ion beam British Journal of Applied Physics. ,vol. 16, pp. 1277- 1284 ,(1965) , 10.1088/0508-3443/16/9/306
Helmut Liebl, Ion Microprobe Mass Analyzer Journal of Applied Physics. ,vol. 38, pp. 5277- 5283 ,(1967) , 10.1063/1.1709314