Interface magnetization of ultrathin epitaxial Co2FeSi(110)/Al2O3 films
作者： M Kallmayer , H Schneider , G Jakob , H J Elmers , B Balke
DOI: 10.1088/0022-3727/40/6/S07
关键词:
摘要: Element-specific magnetic properties of ultrathin epitaxial Co2FeSi(110) films were measured using x-ray circular dichroism (XMCD). The Heusler grown by RF magnetron sputtering on substrates. magnetization thicker as determined XMCD is smaller than expected for a half-metallic material. In addition, the decreases considerably thinner 10 nm. thickness dependence moment can be described introducing certain number dead layers representing deficiency at interfaces. Quantitative evaluation results in layer 0.8 nm room temperature, consisting temperature induced size effect 0.1 nm and surface 0.15 nm top 0.55 nm bottom interface.
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