Probing time-resolved plasma-driven solution electrochemistry in a falling liquid film plasma reactor: Identification of HO2− as a plasma-derived reducing agent

作者: Tanubhav Srivastava , Subhajyoti Chaudhuri , Christopher C Rich , George C Schatz , Renee R Frontiera

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摘要: Many applications involving plasma–liquid interactions depend on the reactive processes occurring at the plasma–liquid interface. We report on a falling liquid film plasma reactor allowing for in situ optical absorption measurements of the time-dependence of the ferricyanide/ferrocyanide redox reactivity, complemented with ex situ measurement of the decomposition of formate. We found excellent agreement between the measured decomposition percentages and the diffusion-limited decomposition of formate by interfacial plasmaenabled reactions, except at high pH in thin liquid films, indicating the involvement of previously unexplored plasma-induced liquid phase chemistry enabled by long-lived reactive species. We also determined that high pH facilitates a reduction-favoring environment in ferricyanide/ferrocyanide redox solutions. In situ conversion measurements of a 1: 1 ferricyanide/ferrocyanide redox …

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