作者: Atul Kulkarni , Byeonghoon Kim , Sreekantha Reddy Dugasani , Pranav Joshirao , Jang Ah Kim
DOI:
关键词:
摘要: Figure S3 (a) PG+ DXL without UV and PG+ DXL with UV light (λ= 254 nm) exposure at d= 1 cm and texp of 10 min.(b) AFM image of UV exposed at d= 1cm and time 10 min. and dotted line indicates the crystal boundary (scan size 1× 1 μm).