A model for polymerization and self-deactivation in two-photon nanolithography: supplemental document

摘要: Figure S1 (a) shows a simplified schematic of the experimental setup. The laser source is a Ti: sapphire femtosecond laser. The laser first passes through a shutter then through a custom prism compressor for pre-compensation of dispersion. A lens pair is used to expand the beam. A half-wave plate (HWP) and linear polarizer (LP) combination is used for power control. A helium neon (HeNe) laser, used for focus detection, is introduced to the beam path by a dichroic mirror (DCM). A piezo-actuated tip/tilt mirror is used to scan the laser beam at the print plane. The beam passes through a tube lens and into an inverted microscope within which the sample is mounted. A CMOS camera is used to collect the reflected beams and the transmitted illumination light for in-situ visual monitoring. Figure S1 (b) shows a simplified schematic of a mounted sample. A 100X objective focuses the beam through immersion oil and through a# 1.5 coverslip to print on the upper surface of the coverslip. The photoresist is sandwiched between the coverslip and a microscope slide, where a gap is created by placing 40 μm thick tape between the coverslip and microscope slide.