Sputtering of CaF 2 Thin Films

摘要: In the present work thin films of different thicknesses deposited on Si substrate have been irradiated with 120 MeV Ag ions with equilibrium charge state and electronic sputtering yield as well as emission of smaller particles/nanoclusters has been studied through Elastic Recoil Detection Analysis (ERDA) and Transmission Electron Microscopy (TEM) respectively. The observed results show maximum sputtering yield at smallest thickness and also nanostructure formation for that thickness has been observed through TEM.