作者: Petros I Stavroulakis , Darren M Bagnall
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摘要: Discussion/Conclusions:The four nanopatterning techniques shown above were analysed and compared to each other in terms of which would be more suitable for mass producing ‘moth-eye’antireflection coatings.Nano-Imprint Lithography and Nano-sphere Lithography are both promising nano-patterning techniques which could be used in mass production. However, it was found that nanosphere lithography was more practical, cheaper and faster in patterning large areas. The first two steps in the nanosphere lithography procedure were sucessfully replicated in the lab and the experimental data which was collected agreed well with methods used in [2].