Textured glass for silicon thin film solar cells

摘要: Textured glass is prepared by ion beam treatment using wet chemically etched aluminium doped zinc oxide films as three dimensional etching masks. The shape and rms roughness of the textured glass can be adjusted by changing the initial ZnO thickness, wet chemical etching duration and ion beam etching parameters. The maximum rms roughness we achieved is 228 nm, with lateral feature size larger than 2 μm. Microcrystalline silicon thin film solar cells grown on the textured glass show certain light trapping effect (Jsc= 20 mA/cm2). This proves that the textured glass prepared by this method is suitable as an alternative substrate for thin film solar cells.