Fluid Model of an Electron Cyclotron Wave Resonance Discharge

Spyridon A. Sfikas , Eleftherios K. Amanatides , Dimitris S. Mataras , Dimitrios E. Rapakoulias
IEEE Transactions on Plasma Science 35 ( 5) 1420 -1425

2
2007
Plasma Treated and a‐C:H Coated PET Performance in Inhibiting Bacterial Adhesion

Maria G. Katsikogianni , Christos S. Syndrevelis , Eleftherios K. Amanatides , Dimitrios S. Mataras
Plasma Processes and Polymers 4

16
2007
Interelectrode space effect on power dissipation and silicon oxide thin film growth from TEOS/O 2 discharges

A Panou , E Amanatides , D Mataras , E Rapakoulias
Journal of Physics: Conference Series 10 ( 1) 202 -205

1
2005
Power consumption effect on the microcrystalline silicon deposition process: a comparison between model and experimental results

B Lyka , E Amanatides , D Mataras , D E Rapakoulias
Journal of Physics: Conference Series 10 ( 1) 198 -201

2
2005
On the effect of the substrate pretreatment parameters on the composition and structure of plasma deposited SiO 2 thin films

Ch Voulgaris , E Amanatides , D Mataras , D E Rapakoulias
Journal of Physics: Conference Series 10 ( 1) 206 -209

3
2005
Comparative study of plasma-deposited fluorocarbon coatings on different substrates

E Farsari , M Kostopoulou , E Amanatides , D Mataras
Journal of Physics D 44 ( 19) 194007

3
2011
Simulation of cylindrical electron cyclotron wave resonance argon discharges

S Sfikas , E Amanatides , D Mataras , D Rapakoulias
Journal of Physics D 44 ( 16) 165204

1
2011
Photoinduced superhydrophilicity of amorphous TiOx-like thin films by a simple room temperature sol-gel deposition and atmospheric plasma jet treatment

V E Vrakatseli , E Pagonis , E Amanatides , D Mataras
Journal of Physics: Conference Series 550 ( 1) 012034

5
2014
ECWR plasma enhanced chemical vapour deposition of microcrystalline silicon thin films

E Farsari , A G Kalampounias , E Amanatides , D Mataras
Journal of Physics: Conference Series 550 ( 1) 012031

2014
On the reliable probing of discrete ‘plasma bullet’ propagation

P Svarnas , K Gazeli , A Gkelios , E Amanatides
Measurement Science and Technology 29 ( 4) 045016

6
2018
Development of a hollow cathode plasma source for microcrystalline silicon thin films deposition

P Dimitrakellis , E Amanatides , D Mataras , D E Rapakoulias
Journal of Physics: Conference Series 275 ( 1) 012014

4
2011
Comparative study of RF reactive magnetron sputtering and sol-gel deposition of UV induced superhydrophilic TiOx thin films

V E Vrakatseli , E Amanatides , D Mataras
Journal of Physics: Conference Series 700 ( 1) 012039

4
2016
Detection of powder formation in SiH4/H2 glow discharges

G Alexiou , G Tsigaras , E Amanatides , D Mataras
Journal of Physics: Conference Series 700 ( 1) 012038

2016
Hierarchical simulation of microcrystalline PECVD silicon thin film growth and structure

D Tsalikis , Ch Baig , VG Mavrantzas , E Amanatides
13th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany 10 -14

2
2012
Plasma Impedance in Discharges

N Spiliopoulos , E Amanatides
CRC Press 1038 -1061

2016
2D Self–Consistent Modeling of Microcrystalline Silicon Deposition Process

B Lykas , E Amanatides , D Mataras
energy 3 ( 2) 5 -5

3
2004
The study and application of 2-D model for microcrystalline silicon thin film

F-r Zhang , X-d Zhang , E Amanatides ,
Journal of Optoelectronics·laser

2008
Modeling and diagnostics of He discharges for treatment of polymers

E Amanatides , D Mataras
Advanced Plasma Technology 55 -74

2
2007