Micromechanical Switches on GaAs for Microwave Applications
John N. Randall , David Denniston , Tsen-Hwang Lin , Chuck Goldsmith
1995
Two-exposure phase shift photolithography with improved inter-feature separation
John N. Randall , Gene E. Fuller
19
2002
High signal-to-noise ratio differential conductance spectroscopy
S. O. Reza Moheimani , Ehud Fuchs , John N. Randall , James H. G. Owen
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 39 ( 1) 010601
2021
Advances in the processing of quantum-coupled devices
John N. Randall , Mark A. Reed , John Luscombe , Gary F. Frazier
Nanostructures and Microstructure Correlation with Physical Properties of Semiconductors 1284 66 -74
7
1990
Digital atomic scale fabrication an inverse Moore's Law – A path to atomically precise manufacturing
John N. Randall , James H.G. Owen , Ehud Fuchs , Joseph Lake
Micro and Nano Engineering 1 1 -14
18
2018
Preparation of x‐ray lithography masks using a tungsten reactive ion etching process
John N. Randall , J. C. Wolfe
Applied Physics Letters 41 ( 3) 247 -248
11
1982
The nanotech impact on IC processing: near and long term
John N. Randall , Richard Stallcup , Taylor Cavanah
Design and process integration for microelectronic manufacturing. Conference 6156 615610
2006
Semiconductor Resonant Tunneling Device Physics and Applications
Mark A. Reed , Alan C. Seabaugh , Yung-Chung Kao , John N. Randall
MRS Proceedings 198 ( 1) 309 -320
1990
Pattern distortions in stencil masks
John N. Randall
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 12 ( 6) 3543 -3546
2
1994
OPC on real-world circuitry
Sean C. O'Brien , Tom Aton , Mark E. Mason , Carl Vickery
Design and process integration for microelectronic manufactring. Conference 5042 107 -115
4
2003
Highly parallel scanning tunneling microscope based hydrogen depassivation lithography
John N. Randall , James H. G. Owen , Joseph Lake , Rahul Saini
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 36 ( 6)
1
2018
Next generation of extreme-resolution electron beam lithography
John N. Randall , James H. G. Owen , Joseph Lake , Ehud Fuchs
Journal of Vacuum Science & Technology B 37 ( 6) 061605
21
2019
Atomically precise digital e-beam lithography
John N. Randall , James H. Owen , Ehud Fuchs , Rahul Saini
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020 11324
2020
A self-tuning controller for high-performance scanning tunneling microscopy
Farid Tajaddodianfar , S. O. Reza Moheimani , James Owen , John N. Randall
2017 IEEE Conference on Control Technology and Applications (CCTA) 106 -110
6
2017
Atomically Precise Manufacturing: The Opportunity, Challenges, and Impact
John N. Randall , James R. Von Ehr , Joshua Ballard , James Owen
asim 89 -106
1
2012
On the effect of local barrier height in scanning tunneling microscopy: Measurement methods and control implications.
Farid Tajaddodianfar , S. O. Reza Moheimani , James Owen , John N. Randall
Review of Scientific Instruments 89 ( 1) 013701
7
2018
Some challenges for mask making to keep up with the roadmap
Rik M. Jonckheere , John N. Randall , Thomas Marschner , Kurt G. Ronse
18th Annual BACUS Symposium on Photomask Technology and Management 3546 313 -324
2
1998
Advances in mask fabrication and alignment for masked ion-beam lithography
Alex R. Shimkunas , Hans Loeschne , David P. Stumbo , George A. Damm
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX 1263 35 -43
1990
Organizing and Program Committee
Petr Glybochko , Valerian E Kagan , Andrey A Svistunov , Denis V Butnaru
Nanostructures and Mesoscopic Systems
1992
LATERAL RESONANT TUNNELING TRANSISTORS: SIMULATION, DESIGN, AND EXPERIMENT
Ann M. Bouchard , James H. Luscombe , Alan C. Seabaugh , John N. Randall
Nanostructures and Mesoscopic Systems 393 -401
1
1992