Next generation of extreme-resolution electron beam lithography
作者： John N. Randall , James H. G. Owen , Joseph Lake , Ehud Fuchs
DOI: 10.1116/1.5119392
关键词: Physics 、 Scanning tunneling microscope 、 Electron-beam lithography 、 Nano- 、 Atomic layer deposition 、 Resist 、 Nanolithography 、 Lithography 、 Electron 、 Condensed matter physics
摘要: … tool of choice is overwhelmingly electron beam lithography. Remarkably small features can be … the authors will refer to as conventional electron beam lithography (CEBL), is reaching its …
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