Thin crystalline functional group copolymer poly(vinylidene fluoride–trifluoroethylene) film patterning using synchrotron radiation
作者： Jaewu Choi , H. M. Manohara , E. Morikawa , P. T. Sprunger , P. A. Dowben
DOI: 10.1063/1.125760
关键词: Synchrotron radiation 、 Materials science 、 Photoemission spectroscopy 、 Electron spectroscopy 、 Analytical chemistry 、 Fermi level 、 Ultraviolet 、 Copolymer 、 Monolayer 、 Photochemistry 、 Thin film
摘要: The photodegradation mechanism due to synchrotron radiation exposure of crystalline poly[vinylidene fluoride–trifluoroetylene, P(VDF–TrFE)] copolymer thin films has been studied with ultraviolet photoemission spectroscopy (UPS) and mass spectroscopy. Upon increasing x-ray white light (hν⩽1000 eV), UPS measurements reveal that substantial chemical modifications occur in P(VDF–TrFE) 5 monolayer films, including the emergence new valence band features near Fermi level, indicating a semimetallic photodegradeted product. photodetached fragments consist mainly H2, HF, CHF, CH2. This study demonstrates possessing unique technologically important properties, can be directly patterned by lithographic processes.
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