The preparation of a novel polymeric sulfonium salt photoacid generator and its application for advanced photoresists
作者： Juan Liu , Yu Qiao , Zhengping Liu , Liyuan Wang
DOI: 10.1039/C4RA02048K
关键词: Sulfonium 、 Resist 、 Ultraviolet visible spectroscopy 、 Sulfonate 、 Photoresist 、 Chemistry 、 Polymer 、 Acetal 、 Polymer chemistry 、 Sulfonic acid
摘要: With poly(4-hydroxylstyrene) (PHS) as a raw material, new type of polymeric photoacid generator (PAG) is synthesized with sulfonium perfluoroalkyl sulfonate groups bonded onto part the benzene rings. The phenolic hydroxyl are esterified to increase solubilities salts in organic solvents. Upon irradiation 254 nm light, units polymer effectively decompose generate sulfonic acid. photolysis confirmed by UV spectroscopy and generation acids which catalyze decomposition t-BOC protection group PAGs. Making use PAGs, positive-tone chemically amplified 248-nm photoresists can be formed them ester acetal high acidolytic activity. photolithography performance photoresist was evaluated using KrF laser exposure system photosensitivity resolution. This novel kind salt PAG applicable for advanced resist materials.
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