Synthesis of novel copolymer based on precipitation polymerization and its application in positive-tone photoresist
作者： Xiangfei Zheng , Changwei Ji , Qingtao Zeng , Jingcheng Liu , Ren Liu
DOI: 10.1007/S10965-017-1370-9
关键词: Methacrylate 、 Copolymer 、 Photoresist 、 Sodium methoxide 、 Nuclear chemistry 、 Materials science 、 Styrene 、 Thermal decomposition 、 Glass transition 、 Precipitation polymerization 、 Polymer chemistry 、 Organic chemistry 、 Materials Chemistry 、 Polymers and Plastics
摘要: A series of copolymers Poly (TBA-CA-St-ASM)(PTCSA) were synthesized via precipitation polymerization by using tert-Butyl acrylate (TBA), Styrene (St), p-acetoxy styrene (ASM), and cedryl methacrylate (CA) as co-monomer. Then, Poly (TBA-CA-St-HS)(PTCSH) was prepared in the presence of sodium methoxide in methanol. The fourier transfer infrared (FT-IR) spectra and proton nuclear magnetic resonance (1 H–NMR) spectra indicated that the synthesis was successful. The molecular weight, glass transition temperature (T g) and …
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sci-hub.se 参考文章(23)
Klaus J. Przybilla, Heinz Roeschert, Walter Spiess, Charlotte Eckes, Subhankar Chatterjee, Dinesh N. Khanna, Georg Pawlowski, Ralph R. Dammel, Progress in DUV resins Advances in Resist Technology and Processing VIII. ,vol. 1466, pp. 174- 187 ,(1991) , 10.1117/12.46368
Juan Liu, Yu Qiao, Zhengping Liu, Liyuan Wang, The preparation of a novel polymeric sulfonium salt photoacid generator and its application for advanced photoresists RSC Advances. ,vol. 4, pp. 21093- 21100 ,(2014) , 10.1039/C4RA02048K
Hiroshi ITO, Greg BREYTA, Don HOFER, R. SOORIYAKUMARAN, Karen PETRILLO, David SEEGER, ENVIRONMENTALLY STABLE CHEMICAL AMPLIFICATION POSITIVE RESIST: PRINCIPLE, CHEMISTRY, CONTAMINATION RESISTANCE, AND LITHOGRAPHIC FEASIBILITY Journal of Photopolymer Science and Technology. ,vol. 7, pp. 433- 447 ,(1994) , 10.2494/PHOTOPOLYMER.7.433
Jean M.J. Fréchet, Eva Eichler, Hiroshi Ito, C.Grant Willson, Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins Polymer. ,vol. 24, pp. 995- 1000 ,(1983) , 10.1016/0032-3861(83)90150-7
Celso Accoto, Antonio Qualtieri, Ferruccio Pisanello, Carlo Ricciardi, Candido Fabrizio Pirri, Massimo De Vittorio, Francesco Rizzi, Two-Photon Polymerization Lithography and Laser Doppler Vibrometry of a SU-8-Based Suspended Microchannel Resonator IEEE\/ASME Journal of Microelectromechanical Systems. ,vol. 24, pp. 1038- 1042 ,(2015) , 10.1109/JMEMS.2014.2376986
Pushkara R. Varanasi, Kathleen M. Cornett, Ahmad D. Katnani, Acid-sensitive arylether-protected poly(4-hydroxystyrene) derivatives for chemically amplified deep-UV positive resists 23rd Annual International Symposium on Microlithography. ,vol. 3333, pp. 512- 523 ,(1998) , 10.1117/12.312381
Dirk J. H. Funhoff, H. Binder, Reinhold Schwalm, Deep-UV resists with improved delay capabilities Advances in Resist Technology and Processing IX. ,vol. 1672, pp. 46- 55 ,(1992) , 10.1117/12.59725
Vikram Singh, V. S. V. Satyanarayana, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves, Towards novel non-chemically amplified (n-CARS) negative resists for electron beam lithography applications Journal of Materials Chemistry C. ,vol. 2, pp. 2118- 2122 ,(2014) , 10.1039/C3TC31826E
Hiroshi Ito, Debra-Fenzel Alexander, Greg Breyta, Dissolution Kinetics and FAG Interaction of Phenolic Resins in Chemically Amplified Resists Journal of Photopolymer Science and Technology. ,vol. 10, pp. 397- 407 ,(1997) , 10.2494/PHOTOPOLYMER.10.397
Sheng Chang, Jian-He Yang, Jung-Hsien Chien, Yu-Der Lee, Synthesis of a novel alkaline-developable photosensitive copolymer based on MMA, MAA, SM, and 2-HEMA-grafted GMA copolymer for an innovative photo-imageable dry-peelable temporary protective plastisol Journal of Polymer Research. ,vol. 20, pp. 115- ,(2013) , 10.1007/S10965-013-0115-7