Progress in DUV resins

摘要: Starting from general arguments on the relation of polymer structure, transparency at 248 nm, resin hydrophilicity and resist dissolution characteristics, binder systems for novel DUV resists are presented, results their lithographic evaluation discussed. Phenolic polymers studied include homo- copolymers 2-, 3-, 4- hydroxystyrenes alkyl substituted derivatives three- component systems, as well 2- 4-hydroxyphenylmethacrylates use in two-component t-BOC-type resists. As an alternative nonphenolic resin, performance a maleimide/styrene copolymer two- system is