A plasma processing apparatus and method
作者： Peter Loewenhardt , Andreas Fischer , Dave Trussel , Bill Kennedy
DOI:
关键词: Optoelectronics 、 Power (physics) 、 Plasma 、 RF power amplifier 、 Plasma processing 、 Auxiliary electrode 、 Generator (circuit theory) 、 Chemistry 、 Electrical engineering 、 Electrode
摘要: The present invention includes a system and method for confining plasma within processing chamber. apparatus comprises first electrode (152), power generator (154), second (156), at least one confinement ring (166), ground extension (160) surrounding the (152). (152) is configured to receive workpiece has an associated area. (154) operatively coupled generate RF that communicated (156) disposed distance from provide complete electrical circuit Additionally, area greater than At (166) assist confine plasma.
lens.org 参考文章(5)
George Mueller, Lumin Li, Perforated plasma confinement ring in plasma reactors ,(1999)
Hiroshi Mabuchi, Katsuo Katayama, Naohiko Takeda, Junya Tsuyuguchi, Hideo Ida, Toshihiro Hayami, Tomomi Murakami, Plasma processing apparatus utilizing a microwave window having a thinner inner area ,(1997)
Shimao Yoneyama, Kazufumi Kaneko, 和史 金子, 詩麻夫 米山, Plasma treatment device ,(2008)
Susumu Aiuchi, Toru Otsubo, Teru Fujii, Takashi Kamimura, Minori Noguchi, Dry etching apparatus ,(1984)