作者: M. Rinner , K. Volz , W. Ensinger , W. Assmann , B. Rauschenbach
DOI: 10.1016/S0257-8972(97)00650-6
关键词: Nitride 、 Transmission electron microscopy 、 Ion implantation 、 Materials science 、 Elastic recoil detection 、 Nitrogen 、 Titanium nitride 、 Electron cyclotron resonance 、 Analytical chemistry 、 Mineralogy 、 Tin
摘要: Abstract Ti6Al4V has been treated with nitrogen Plasma Immersion Ion Implantation (PIII). Implantations high-voltage pulses have carried out at 50- and 400-Hz pulse repetition rates for varying process times in a plasma generated by electron cyclotron resonance (ECR) microwave excitation. Due to the different power input these rates, corresponding sample temperature reached 200 450 °C, respectively. Nitride formation was studied relation retained dose. The composition of modified surface layer determined elastic recoil detection analysis (ERD), structure morphology were means X-ray diffraction (XRD) cross-section transmission microscopy (XTEM). content increases total number irrespective rate. could be proved presence (200) TiN reflection. A homogeneous fine crystalline built up, exhibiting strong crystallographic orientation relationship substrate grains.