Device-Quality β-Ga2O3 Epitaxial Films Fabricated by Ozone Molecular Beam Epitaxy

作者: Kohei Sasaki , Akito Kuramata , Takekazu Masui , Encarnación G. Víllora , Kiyoshi Shimamura

DOI: 10.1143/APEX.5.035502

关键词: DopingOzoneSchottky barrierMaterials scienceEpitaxyDiodePlatinumOptoelectronicsBreakdown voltageMolecular beam epitaxy

摘要: N-type Ga 2 O 3 homoepitaxial thick films were grown on β-Ga 2 O 3 (010) substrates by ozone molecular beam epitaxy. The epitaxial growth rate was increased by more than ten times …

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