作者: H. Kung , Y-C. Lu , A. J. Griffin , M. Nastasi , T. E. Mitchell
DOI: 10.1063/1.119611
关键词: Transmission electron microscopy 、 Texture (crystalline) 、 Cubic crystal system 、 Fermi level 、 Crystal structure 、 Phase (matter) 、 Crystallography 、 Fermi energy 、 Electron energy loss spectroscopy 、 Materials science
摘要: The deposition of thin alternating layers Cu and Nb on Si(100) substrates has been studied by transmission electron microscopy as a function layer thickness. For thickness above 25 A, there is strong texture orientation relationship with the close packed planes fcc parallel to bcc Nb, forming so-called “Kurdjumov-Sachs” relationship. However, at thicknesses under 12 constrained grow slightly distorted structure. It thought that, when it reaches critical between 20 loses coherency transforms martensitically phase, resulting in observed Kurdjumov–Sachs Electron energy loss spectroscopy observations indicate difference 2 eV L3 edge suggesting that Fermi lower form than equilibrium