The electrical behavior of the fundamental high frequency (150 MHz) quartz crystal unit in the plasmatic environment
作者： M. Tanaka , T. Ugajin , N. Araki , Y. Oomura
关键词: Photolithography 、 Electrode 、 Resonator 、 Materials science 、 Electronic engineering 、 Crystal 、 Optoelectronics 、 Quartz 、 Isotropic etching 、 Reactive-ion etching 、 Etching (microfabrication)
摘要: Both photolithography technique and chemical etching process were experimentally employed for producing 150 MHz rectangular AT-cut crystal resonators. A plasma treatment was a frequency adjustment by gold (Au) electrode films. large shift from designed observed. In this paper, the reasons are electrically chemically explained why shifts occurred after treatment.
sci-hub.se 参考文章(6)
M. Tanaka, T. Ugajin, N. Araki, Y. Oomura, The electrical behavior of crystal unit resonating at the fundamental frequency 150 MHz international frequency control symposium. pp. 329- 335 ,(1996) , 10.1109/FREQ.1996.559875
Masako Tanaka, Takayuki Ugajin, Nobushige Araki, Yoshimasa Oomura, The Resonating Properties of a Crystal Unit of Fundamental Frequency 150 MHz. Japanese Journal of Applied Physics. ,vol. 36, pp. 3022- 3027 ,(1997) , 10.1143/JJAP.36.3022
O. Ishii, T. Shibata, T. Ohshima, High frequency fundamental VCXO for SDH system international frequency control symposium. pp. 714- 721 ,(1996) , 10.1109/FREQ.1996.560245
Tadahisa SHIONO, Masahiro SHIBAGAKI, Frequency shifts of quartz crystal units after adjusting frequencies Journal of Advanced Science. ,vol. 7, pp. 9- 11 ,(1995) , 10.2978/JSAS.7.9
G�nter Sauerbrey, Verwendung von Schwingquarzen zur Wägung dünner Schichten und zur Mikrowägung European Physical Journal. ,vol. 155, pp. 206- 222 ,(1959) , 10.1007/BF01337937
G. Sauerbrey, F. Sauerbrey, Use of quartz vibration for weighing thin films on a microbalance ,(1959) , 10.1007/BF01337937