作者: M. Geddo , M. Patrini , G. Guizzetti , M. Galli , R. Trotta
DOI: 10.1063/1.3597818
关键词: Wide-bandgap semiconductor 、 Optoelectronics 、 Refractive index 、 Heterojunction 、 Passivation 、 Materials science 、 Gallium arsenide 、 Irradiation 、 Annealing (metallurgy) 、 Band gap
摘要: The effect of hydrogen irradiation on the optical properties GaAs1−xNx/GaAs heterostructures was investigated using photoreflectance and reflectance techniques. Systematic measurements performed both as-grown hydrogenated samples for N-concentrations ranging from 0.0% to 3.5% H-implanted doses 3 × 1018 6 × 1018 ions/cm2 have shown that (a) H-induced widening energy gap is accompanied by a decrease refractive index H-treated with respect ones, resulting in an mismatch can be as large 2% subgap spectral region; (b) presence compressive strain fully passivated GaAsN determines even below GaAs eliminated via moderate thermal annealing. These findings are promising development planar geometry, which simultaneous confinement carriers photons, nanometric scale, obtained single ...