Apparatus for coating substrate

作者: Takayuki Umaba

DOI:

关键词: CoatingCapillary actionInletElectronic engineeringSubstrate (printing)Surface (mathematics)Front and back endsEdge (geometry)Materials scienceMechanism (engineering)Composite material

摘要: A substrate coating apparatus includes a stage, liquid tank, and moving mechanism. The stage holds the to be vertical or inclined. tank has hollow body extending along widthwise direction of substrate, with opposing ends closed. protruding front end surface which can positioned facing coated. an outlet path having opening over width area coated, inlet opened in below outlet. mechanism such that thereof faces prescribed space, for example, 0.1 0.3 mm, therebetween. moves vertically relative from start position position, while predetermined space between is maintained. lower edge path. upper being maximum height reached by gap capillary action or, it may formed above height, assuming coated extend infinitely upward define said size

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