Positive photosensitive composition, thin film transistor, and compound
作者： Komei Tahara , Aki Kitajima , Hirofumi Inari , Masahito Ide , Takao Manabe
DOI:
关键词: Thin-film transistor 、 Molecule 、 Thin film 、 Catalysis 、 Polymer chemistry 、 Hydrosilylation 、 Group (periodic table) 、 Chemistry 、 Photoacid generator 、 Composition (combinatorics)
摘要: The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit electrical insulation reliability when cured (as thin films). composition according a first aspect of the is characterized by including (A) compound contains an alkenyl group or SiH within molecule has structure decomposes in presence acid generate acidic hydroxyl group; (B) molecule; (C) hydrosilylation catalyst; (D) photoacid generator.
lens.org 参考文章(16)
Ratnam Sooriyakumaran, Qinghuang Lin, Patternable low dielectric constant materials and their use in ULSI interconnection ,(2003)
Yoshitaka Nishiyama, Satoshi Sugiyama, Takao Manabe, Hiroyuki Tanaka, Polysiloxane composition, hardened material and optical device ,(2011)
Makoto Seino, Shinya Mizuta, Takao Manabe, Polyhedral polysiloxane modified product and composition using the modified product ,(2008)
Makoto Seino, Masahito Ide, Takao Manabe, Alkali-developable curable composition, insulating thin film using the same, and thin film transistor ,(2008)
Frédéric Tronc, Laurence Lestel, Catherine Amiel, Sylvie Boileau, Adsorption of Polysiloxanes Bearing Anchoring Phenol Groups onto Silica Particles Langmuir. ,vol. 15, pp. 7080- 7083 ,(1999) , 10.1021/LA981274R
F. Tronc, L. Lestel, S. Boileau, Polycondensation using hydrosilylation: a tool for preparing tailor-made polysiloxanes with anchoring groups Polymer. ,vol. 41, pp. 5039- 5046 ,(2000) , 10.1016/S0032-3861(99)00566-2
W. C. Peter Tsang, Christopher Apanius, Andrew Bell, Leah Langsdorf, Polymer Composition for Microelectronic Assembly ,(2011)
Hiroshi Morita, 仁一 尾見, 宏美 竹之内, 博 森田, Jun Kobayashi, Hiromi Takenouchi, 純 小林, Junichi Omi, Positive photosensitive composition and permanent resist ,(2010)
Masahito Ide, 貴雄 眞鍋, Takao Manabe, 正仁 井手, Photocurable composition, and insulating thin film and thin film transistor obtained using the same ,(2009)