Quantum Mechanical TCAD Study of Epitaxial SiGe Thermistor Layers

作者: Frank Niklaus , Fredrik Forsberg , Mohammadreza Kolahdouz , Gunnar Malm

DOI:

关键词: ThermistorFormalism (philosophy of mathematics)Thermal coefficientOptoelectronicsMechanical engineeringQuantumPredictive simulationEpitaxyMaterials science

摘要: The thermal coefficient of resistance (TCR) for epitaxial silicon-germanium (SiGe) layers has been analyzed by experiment and simulation. Predictive simulation using drift-diffusion formalism s ...

参考文章(3)
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