Cloning SU8 silicon masters using epoxy resins to increase feature replicability and production for cell culture devices

摘要: In recent years, there has been a dramatic increase in the use of poly(dimethylsiloxane) (PDMS) devices for cell-based studies. Commonly, negative tone photoresist, SU8, is used to pattern features onto silicon wafers create masters (SU8-Si) PDMS replica molding. However, complexity fabrication process, low feature reproducibility (master-to-master variability), silane toxicity, and short life span these have deterrents using SU8-Si production cell culture based microfluidic devices. While other techniques demonstrated ability generate multiple from single master, they often do not match high resolution (∼0.1 μm) surface roughness that soft lithography offer. this work, we developed method fabricate epoxy-based allows replication with fidelity directly via their replicas. By method, show could obtain many epoxy equivalent master variance 1.54%. Favorable transfer resolutions were also obtained by an appropriate Tg system ensure minimal shrinkage ranging size ∼100 μm <10 μm height. We further coating Cr/Au lead effective demolding yield chambers are suitable long-term culturing sensitive primary hippocampal neurons. Finally, incorporated pillars within Au-epoxy eliminate process punching media reservoirs thereby reducing substantial artefacts wastage.