UV nanoimprint for the replication of etched ZnO:Al textures applied in thin‐film silicon solar cells

摘要: In this work, we present a technology for high precision nanostructure replication process based on ultraviolet nanoimprint lithography the application in field of thin-film photovoltaics. The potential is demonstrated by fabrication microcrystalline silicon prototype solar cells. accuracy random microstructures made from sputtered and etched ZnO:Al, used to scatter incident light thin cells, shown local topography investigations same 7.5 × 7.5 µm2 area master replica. Different types imprint resists moulds were investigated find optimal, technology. Two p-i-n n-i-p configuration, fabricated study different applications. It that cells deposited an imprinted glass hold similar performances compared with reference standard textured ZnO:Al. Thus, it scattering structures using attractive method decouple properties layer forming electrical front contact. Because simple cheap throughput used, additionally proves relevance industrial mass production Copyright © 2013 John Wiley & Sons, Ltd.