Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour
作者： Oliver Kluth , Gunnar Schöpe , Jürgen Hüpkes , Chitra Agashe , Joachim Müller
DOI: 10.1016/S0040-6090(03)00949-0
关键词: Ceramic 、 Sputter deposition 、 Cavity magnetron 、 Isotropic etching 、 Sputtering 、 Substrate (electronics) 、 Materials science 、 Composite material 、 Mineralogy 、 Thin film 、 Etching (microfabrication)
摘要: … Magnetron sputtered ZnO films are applied in a variety of thin film devices. For example, … be realised for sputtered ZnO:Al films by the combination of optimised sputter process conditions …
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huepkes.de 参考文章(13)
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