On structure and properties of sputtered Ti and Al based hard compound films

摘要: After investigating basic correlations between process and film characteristics in previous works new multicomponent hard coatings, on the basis of Ti–Al and Ti–Zr, have been deposited by magnetron sputtering. These ternary and quaternary nitrides are crystallizing in a face centered cubic TiN lattice with reduced or enlarged lattice parameters depending on the amount and the radius of foreign atoms. Improved wear behavior compared to chemical vapor deposition (CVD) TiN coatings has been stated with (Ti, Al) N,(Ti, Zr) N, and (Ti, Al, V) …