Analysis of electrochemically deposited chromium films
作者： Asawari Joshi , S. K. Kulkarni
DOI: 10.1007/BF00585450
关键词: Materials science 、 Oxide 、 X-ray photoelectron spectroscopy 、 Scanning electron microscope 、 Annealing (metallurgy) 、 Metallurgy 、 Chromic acid 、 Chromium carbide 、 Chromium 、 Indentation hardness 、 Chemical engineering
摘要: Chromium films are deposited on mild steel substrates using chromic acid bath with formic as an additive. The effect of air annealing the has been investigated hardness tests, grazing angle X-ray diffraction, photoelectron spectroscopy and scanning electron microscopy. It is observed that chromium goes increasing from 1100 to 1500 VHN temperature till 500‡ C, which can be explained by formation carbide surface. decreases further due strong oxide well cracking.
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