作者: Lianchang Zhang , Ming Ni , Donghua Liu , Dongxia Shi , Guangyu Zhang
DOI: 10.1021/JP310134G
关键词: Graphene 、 Etching (microfabrication) 、 Nanotechnology 、 Chemical engineering 、 Chemical vapor deposition 、 Graphene oxide paper 、 Nucleation 、 Graphene nanoribbons 、 Remote plasma 、 Materials science 、 Epitaxy
摘要: In this paper, we studied the competition of growth and etching during graphene epitaxial growth in the remote plasma enhanced chemical vapor deposition (r-PECVD) system …