Method of determining the radiation dose in a lithographic apparatus
作者： Peter Dirksen , Jan E. van der Werf , Manfred G. Tenner
DOI:
关键词: Optical alignment 、 Substrate (printing) 、 Optics 、 Materials science 、 Radiation 、 Latent image 、 Lithography 、 Radiation dose 、 Layer (electronics)
摘要: A method and apparatus for forming a pattern on substrate (w), either or not via mask (c), are described. The radiation dose can be measured accurately reliably by measuring latent image of new, asymmetrical test mark (TM) means an optical alignment device present in the associated therewith, this being formed production (PB) radiation-sensitive layer substrate.
google.de 参考文章(2)
Peter Dirksen, Walter de Laat, Henry J. L. Megens, Latent image metrology for production wafer steppers Optical/Laser Microlithography VIII. ,vol. 2440, pp. 701- 711 ,(1995) , 10.1117/12.209297
Manfred Gawein Tenner, Peter Dirksen, Jan Evert Van Der Werf, Cornelis Marinus Johannes Van Uijen, Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method ,(1995)