Atomistic simulations of low energy ion assisted vapor deposition of metal multilayers

作者: X. W. Zhou , H. N. G. Wadley

DOI: 10.1063/1.372172

关键词: Materials sciencePhysical vapor depositionIon platingDeposition (phase transition)Ion beam mixingAnalytical chemistryChemical vapor depositionMolecular beam epitaxyIon beam-assisted depositionIon beam deposition

摘要: … magnetoresistance multilayers are a sensitive function of the vapor deposition process used for their synthesis. The highest magnetoresistance … gas atom hypersonic beam technology …

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