Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap
作者： Alexander Straaijer , Helmar Van Santen , Aleksey Yurievich Kolesnychenko , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema
DOI:
关键词: Engineering 、 Lithography 、 Optics 、 Mechanical engineering 、 Projection system
摘要: An exposure apparatus including a liquid supply system configured to provide space between the projection and an object, movable table having recess, recess therein object or surface hold support wherein gap opening into which can enter is defined peripheral wall of further fluid opening, below remove entering opening.
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