Deposition of layer using depositing apparatus with reciprocating susceptor
作者： Chang Wan Hwang , Sang In Lee
DOI:
关键词: Deposition (phase transition) 、 Atomic layer deposition 、 Materials science 、 Reciprocating motion 、 Layer (electronics) 、 Injector 、 Susceptor 、 Substrate (printing) 、 Analytical chemistry 、 Composite material
摘要: Atomic layer deposition is performed by reciprocating a susceptor in two directions, subjecting substrate on the to different sequences of processes. By processes, undergoes processes that otherwise would have required an additional set injectors or reactors. The reduced number reactors enables more compact device, and reduces cost associated with device.
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