Multielement Determination of Ultratrace Impurities in High Purity Tantalum Metals by Flow Injection/Inductively Coupled Plasma Mass Spectrometry
作者： Shuji KOZONO , Hiromu SAKAMOTO , Ryuma TAKASHI , Hiroki HARAGUCHI
关键词: Mass spectrometry 、 Nitric acid 、 Tantalum 、 Chemistry 、 Inductively coupled plasma mass spectrometry 、 Impurity 、 Detection limit 、 Hydrofluoric acid 、 Analytical chemistry 、 Inductively coupled plasma
摘要: A rapid and sensitive method for the determination of impurity elements in high purity tantalum metals is proposed. Tantalum were digested with nitric acid (HNO3) hydrofluoric (HF). The sample solutions injected into a flow injection system cation exchange column. Impurity adsorbed eluted mixture HNO3 HF, then effluent was introduced an ICP plasma conventional pneumatic nebulization. In present injection/ICP-MS system, detection limits, based on 3 times standard deviation blank, range 0.03 - 6 ng/g 16 (Li, Na, Mg, Mn, Co, Cu, Zn, Ga, Rb, Sr, Cd, In, Ba, Tl, Pb, Bi).
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