Determination of impurity elements in high-purity solid precursors based on tantalum pentoxide by inductively coupled plasma mass spectrometry

摘要: Conditions for the inductively coupled plasma mass-spectrometric (ICP MS) analysis of high-purity tantalum pentoxide and doped with rare-earth elements without separation a sample matrix from analytes (Mg, Al, Si, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zr, Nb, Mo, Sn, W, Gd, Dy, Er, Pb) were determined. The metrological parameters ICP MS (accuracy, precision, detection limits) calculated. It was established that, in test solutions concentrations higher than 30 mg/L, effect appeared: intensity measured ion current decreased against background high concentration (tantalum) ions. This caused proportional underestimation results analysis. shown that it is reasonable to plot calibration functions solution containing no more mg/L compared X-ray fluorescence (XRF) optical emission spectrometry (OES) data calculation on amounts admixtures introduced into at stage extraction preparation precursor.