Low-temperature intermediate Au-Si wafer bonding; eutectic or silicide bond

作者: R.F. Wolffenbuttel

DOI: 10.1016/S0924-4247(97)01550-1

关键词: Composite materialSilicideWafer bondingMaterials scienceMetallurgyEutectic systemThermocompression bondingAnodic bondingDiffusion barrierEutectic bondingBarrier layer

摘要: … AuSi bond with a Ti adhesion layer involves the dissolving of the oxide layer by silicidation of the titanium layer and the subsequent direct Au-Si … than the Au-Si eutectic temperature. …

参考文章(25)
W. R. Runyan, Kenneth E. Bean, Semiconductor integrated circuit processing technology Addison-Wesley. ,(1990)
R.F. Wolffenbuttel, Silicon sensors and circuits : on-chip compatibility Chapman. ,(1996)
D.Y. Sim, T. Kurabayashi, M. Esashi, Bakable Silicon Pneumatic Microvalve Proceedings of the International Solid-State Sensors and Actuators Conference - TRANSDUCERS '95. ,vol. 2, pp. 280- 283 ,(1995) , 10.1109/SENSOR.1995.721800
W. P. Maszara, Silicon‐On‐Insulator by Wafer Bonding: A Review Journal of The Electrochemical Society. ,vol. 138, pp. 341- 347 ,(1991) , 10.1149/1.2085575
H.J. Quenzer, W. Benecke, Low-temperature silicon wafer bonding Sensors and Actuators A-physical. ,vol. 32, pp. 340- 344 ,(1992) , 10.1016/0924-4247(92)80009-R
Masayoshi Esashi, Akira Nakano, Shuichi Shoji, Hiroyuki Hebiguchi, Low-temperature silicon-to-silicon anodic bonding with intermediate low melting point glan Sensors and Actuators A: Physical. ,vol. 23, pp. 931- 934 ,(1990) , 10.1016/0924-4247(90)87062-N
J. Haisma, G. A. C. M. Spierings, U. K. P. Biermann, J. A. Pals, Silicon-on-Insulator Wafer Bonding-Wafer Thinning Technological Evaluations Japanese Journal of Applied Physics. ,vol. 28, pp. 1426- 1443 ,(1989) , 10.1143/JJAP.28.1426
R.F. Wolffenbuttel, K.D. Wise, Low-temperature silicon wafer-to-wafer bonding using gold at eutectic temperature Sensors and Actuators A-physical. ,vol. 43, pp. 223- 229 ,(1994) , 10.1016/0924-4247(93)00653-L
Peter P. Gillis, J. J. Gilman, Double‐Cantilever Cleavage Mode of Crack Propagation Journal of Applied Physics. ,vol. 35, pp. 647- 658 ,(1964) , 10.1063/1.1713430