Investigation of oval defects in (In)Ga(Al)As/GaAs heterostructures by spatially resolved photoluminescence and micro-cathodoluminescence

作者: Anna Szerling , Kamil Kosiel , Anna Wójcik-Jedlińska , Mariusz Płuska , Maciej Bugajski

DOI: 10.1016/J.MSSP.2006.01.071

关键词: Materials scienceGalliumHeterojunctionMicrostructurePhotoluminescenceEpitaxyCathodoluminescenceMolecular beam epitaxyOptoelectronicsScanning electron microscopeAnalytical chemistryMechanical engineeringGeneral Materials ScienceMechanics of MaterialsCondensed matter physics

摘要: Oval defects, which are commonly found in epitaxial (In)Ga(Al)As heterostructures grown by molecular beam epitaxy (MBE) technique, studied this paper. The investigations of the morphology as well optical properties defects were performed scanning electron microscopy (SEM), cathodoluminescence (CL) and spatially resolved photoluminescence (SRPL). conclusions drawn to sources conditions their appearance possible internal structure.

参考文章(9)
Naresh Chand, S.N.G. Chu, A comprehensive study and methods of elimination of oval defects in MBE-GaAs Journal of Crystal Growth. ,vol. 104, pp. 485- 497 ,(1990) , 10.1016/0022-0248(90)90151-A
J. J. Russell-Harriott, J. Zou, A. R. Moon, D. J. H. Cockayne, B. F. Usher, Investigation of oval defects in InGaAs/GaAs strained-layer heterostructures using cathodoluminescence and wavelength dispersive spectroscopy Applied Physics Letters. ,vol. 73, pp. 3899- 3901 ,(1998) , 10.1063/1.122929
K. Klima, M. Kaniewska, K. Reginski, J. Kaniewski, Oval Defects in the MBE Grown AlGaAs/InGaAs/GaAs and InGaAs/GaAs Structures Crystal Research and Technology. ,vol. 34, pp. 683- 687 ,(1999) , 10.1002/(SICI)1521-4079(199906)34:5/6<683::AID-CRAT683>3.0.CO;2-T
A. C. Papadopoulo, F. Alexandre, J. F. Bresse, Characterization of oval defects in molecular beam epitaxy Ga0.7Al0.3As layers by spatially resolved cathodoluminescence Applied Physics Letters. ,vol. 52, pp. 224- 226 ,(1988) , 10.1063/1.99526
H. Kawada, S. Shirayone, K. Takahashi, Reduction of surface defects in GaAs layers grown by MBE Journal of Crystal Growth. ,vol. 128, pp. 550- 556 ,(1993) , 10.1016/0022-0248(93)90384-9
Masanori Shinohara, Tomonori Ito, Thermodynamic study on the origin of oval defects in GaAs grown by molecular‐beam epitaxy Journal of Applied Physics. ,vol. 65, pp. 4260- 4267 ,(1989) , 10.1063/1.343310
Shang‐Lin Weng, Ga2O3: The origin of growth‐induced oval defects in GaAs molecular beam epitaxy Applied Physics Letters. ,vol. 49, pp. 345- 347 ,(1986) , 10.1063/1.97163
S. Matteson, H. D. Shih, Morphological studies of oval defects in GaAs epitaxial layers grown by molecular beam epitaxy Applied Physics Letters. ,vol. 48, pp. 47- 49 ,(1986) , 10.1063/1.96757
Young G. Chai, Robert Chow, Source and elimination of oval defects on GaAs films grown by molecular beam epitaxy Applied Physics Letters. ,vol. 38, pp. 796- 798 ,(1981) , 10.1063/1.92167