Method for treating a transport support for the conveyance and atmospheric storage of semiconductor substrates, and treatment station for the implementation of such a method
作者： Erwan Godot , Amaud Favre , Remi Thollot
DOI:
关键词: Vacuum pump 、 Process engineering 、 Semiconductor 、 Foreign Bodies 、 Materials science
摘要: The aim of the invention is to provide a method for treatment transport support ( 1 ) conveyance and storage semiconductor substrates, with said possibly having first undergone cleaning operation using liquid. includes stage in which placed sealed chamber 4 connected vacuum pump 5 subjected combined action subatmospheric pressure infrared radiation favor removal foreign bodies on walls ). also concerns station implementation method.
lens.org 参考文章(41)
Robert S Goebel, Charles P Scholz, Apparatus for dehydration of refrigeration hermetic compressors ,(1958)
Gerard Bedard, Apparatus And Method for Monitoring A Heating System ,(2008)
Eiji Usui, Junichi Sugai, Method and apparatus for drying wet work ,(1991)
Jai-Kang Jeon, Sang-young Mun, Hyun-joon Kim, Yun-Soo Han, Dry cleaner for wafer carriers ,(1996)
Wilhelm Schmidbauer, Werner Ott, Hanns Wochner, Vacuum drying of semiconductor fragments ,(1998)
Wilhelmus Johannes Elisabeth Maria Wilbers, Baking apparatus and method for baking edible products ,(2000)
Tetsuji Togawa, Koji Ato, Dehydration drying method and apparatus, and substrate processing apparatus ,(2003)
Michael Peters, Matthew DeFranco, Portable sterilizing towel warmer ,(2009)
Charles S. Leech, Chester W. Chapman, Forced air vacuum drying ,(1996)
Iain F. McVey, Infrared monitor and control for vapor hydrogen peroxide processing techniques ,(2002)